| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_e757fd4fedc4fe825bb81b1b466a0947 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S438-906 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-306
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02063
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76814 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-306
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-768 |
| filingDate |
1998-06-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2000-03-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_71d5a087c23ee24328e7cafe2577df4a
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_474abad8ae54bf57a2225405f0529cf0
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_77dc07283deafe7b28138817359b9888
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c5f57d642413e0b603b26d0f47a743fa
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7657b29d376a8f1083d5c897c05b25aa |
| publicationDate |
2000-03-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
TW-385502-B |
| titleOfInvention |
Selective removal of etching residues |
| abstract |
Etching residue is selectively removed employing a substantially non-aqueous composition containing a fluoride containing compound and certain organic solvents. Preferred compositions also include an anhydride. |
| priorityDate |
1997-11-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |