| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_10636948adeff7a4f9c77a5c45be2245 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y02C20-10
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01D2257-404
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01D2257-402 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01D53-565
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01J20-103
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01D53-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01J20-06
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01J20-08 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B01D53-56
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B01D53-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B01D53-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B01J20-06 |
| filingDate |
1998-05-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2000-02-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_90c95ff8108acddf4825305c166a6b27
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e77fd408443c59b8968a491e24fe9d15 |
| publicationDate |
2000-02-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
TW-381977-B |
| titleOfInvention |
Process for removing nitrogen oxides from gases |
| abstract |
The invention relates to a process for removing nitrogen oxides from a fluid, the fluid being the feed air or a product or product mixture or a process fluid of an air separation plant. according to the invention, the nitrogen oxides are removed by chemisorption on metal oxides. The metal oxides are preferably formed from metals of the 6th to 8th subgroup, manganese dioxide (MnO2) being particularly preferred as the metal oxide. The process can comprise one or more reactor beds, which are preferably operated at 10 to 40 degrees C and are regenerated with nitrogen at a temperature from 130 to 170 degrees C. The process can be used for the recovery of gases of extreme purity, for example for the manufacture of semiconductors. |
| priorityDate |
1997-06-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |