| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_460c960cd09203c2f1727bc268569e14 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05K3-0076 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-031
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B32B15-08
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-033
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-032
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0048 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-033
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09D4-06
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09D4-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05K3-18
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09D4-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05K3-06
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05K3-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-031
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-027 |
| filingDate |
1995-02-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
1999-02-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1a48bf4b6593519efe22878f32a31137
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_243d12dbb9a4dac06a2c1eb50cd148b5
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6982e943eed05b2fcd3c31f74c6ccd40
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3250f8b92049c77de4a3a797414617da |
| publicationDate |
1999-02-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
TW-353158-B |
| titleOfInvention |
Aqueous photoresist composition, method for preparing the same and circuit board comprising thereof |
| abstract |
An aqueous photoresist composition characterized by increased shear and storage stability, the photoresist composition comprising an aqueous emulsion including the following materials: (a) a carboxylated resin having a glass transition temperature of at least 60 DEG C; (b) an acrylate ester; (c) a photo initiator; (d) a base selected from an alkali metal salt, an amine and mixtures thereof; and (e) based on the emulsion solid of the composition, 0.1% to 10% of a non-onic surfactant containing at least 4 ethylene-oxide segments; in which the base exists in an amount of 0.05 to 0.2 equivalent per acid equivalent in the resin. |
| priorityDate |
1994-03-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |