http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-339313-B

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filingDate 1997-08-01-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 1998-09-01-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d69d414bd4ac77130dddbab1eda78580
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publicationDate 1998-09-01-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber TW-339313-B
titleOfInvention Photoresist layer supporting polyester flm and photoresist film laminate
abstract A sort of photoresist layer supporting polyester film which is a biaxially oriented film formed from a polyester containing 0.01 to 0.1% b weight of porous silica particles as agglomeraes of primary particles having an average particle diameter of 0.01 to 0.1um and an average particle diameter of 0.1 to 5 um and a pore volume of 0.5 to 2.0 ml/g, the number of the porous silica coarse particles having a major diameter or not smaller than 50um being 10 or less per m2.
priorityDate 1996-08-07-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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Total number of triples: 29.