http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-320581-B
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_5d7576285d411d00c697e07270d2814a |
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G05B2219-45221 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B23H2400-10 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B23H7-14 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B23H7-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B23H1-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B23H7-26 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B23H7-30 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B23H7-28 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B23H7-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B23H7-30 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B23H7-26 |
| filingDate | 1997-02-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 1997-11-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2f774179a03f33eb6e8b5b61e2ff3e9c http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b33defdf832081f5a37553f4976569e1 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_cb63b4edcac7c1b7c18707fc5afedf2a |
| publicationDate | 1997-11-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | TW-320581-B |
| titleOfInvention | The electrical discharge processing apparatus and method |
| abstract | An electrical discharge processing apparatus. It is by adding impulse voltage between electrode and processed part, and proceeding 3D controlling by NC to get desired shape; Its features include: - Memory device for memorized 1st processing on slit, 2D profile path of 1st machinery, taper size of expecting-to-process side, feeding amount of electrode along X-Y direction and data table of machinery condition; - Off-set adding device for adding off-set information on profile path; - Process calculating device for calculating processing depth at each cycle, reaching to object depth of electrode path and repeating processing times according to depth, feeding amount, electric condition and electrode diameter of above taper size of side surface; - Variation of off-set calculating device for calculated each off-set changing amount of electrode according to above taper size of side surface and processing times; - Electrode position controlling device for controlled above off-set changing amount by adding off-set position, which is passed by electrode at each time, on above profile path; - The 2nd time processing device for controlled the hollow straight electrode to rotate along Z axis and proceed taper processing at side of slit. |
| priorityDate | 1996-06-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 33.