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classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-67
filingDate 1996-10-18-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 1997-07-01-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1a3851283c8e585e1bffa4f1892caf36
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5e6cb5ed4b2ef536604c7f9b0c013e37
publicationDate 1997-07-01-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber TW-309643-B
titleOfInvention Method of increasing electrostatic chunking effect by wafer surface processing
abstract A method of improving electrostatic chucking device operating between silicon wafer and susceptor in wafer processing vacuum room comprises of the following steps: (1) supplying one silicon wafer, whose side contacting with susceptor has one insulator on its surface; (2) on the above insulator surface forming one conductive layer; (3) placing the above silicon wafer on susceptor, and the above conductive layer contacts with susceptor.
priorityDate 1996-10-18-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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