| abstract |
An object of the present invention is to provide a salt, an acid generator, and a resist composition capable of producing a resist pattern having good CD uniformity (CDU). A salt represented by formula (I), an acid generator and a resist composition. [In the formula, Q 1 and Q 2 represent a fluorine atom or a perfluoroalkyl group, respectively. R 11 and R 12 each represent a hydrogen atom, a fluorine atom or a perfluoroalkyl group. z represents an integer of 0-6. X 1 and X 2 represent *-CO-O-, *-O-CO- and the like, respectively. L 1 represents a single bond or a hydrocarbon group which may have a substituent. A 1 represents a group containing a lactone structure which may have a substituent. L 2 and L 3 represent a single bond or an alkanediyl group, respectively. R 1 represents an iodine atom or a haloalkyl group. R 2 represents a halogen atom, a hydroxyl group, a haloalkyl group or an alkyl group. m2 represents an integer of 0-4. Z + represents an organic cation. ] |