| abstract |
An object of the present invention is to provide a compound, a resin, and a resist composition containing the same which can produce a resist pattern having good CD uniformity (CDU). A compound represented by formula (I), a resin and a resist composition. [In the formula, R 1 represents an alkyl group, a hydrogen atom or a halogen atom which may have a halogen atom. L 1 represents a single bond or -CO-O-*. R 3 represents an alkyl group, and -CH 2 - contained in the group may be substituted by -O- or -CO-. R 4 represents a fluorine atom, a fluorinated alkyl group or an alkyl group, and the fluorinated alkyl group and -CH 2 - contained in the alkyl group may be substituted with -O- or -CO-. R 5 represents a hydrogen atom, an alkylcarbonyl group or an acid labile group. m2 and m3 represent an integer of 1 to 3, m4 represents an integer of 0 to 2, and m5 represents 1 or 2. Among them, 3≦m2+m3+m4+m5≦5. ] |