patent/TW-202214661-A

http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-202214661-A

Outgoing Links

Predicate	Object
assignee	http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_36333273e27f0db23ddddbf80ba79ba7
classificationCPCInventive	http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07F9-90 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0048 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07F9-94 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-167 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07F5-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-168 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07F7-22 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07F11-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0042
classificationIPCInventive	http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07F9-94 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07F11-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07F7-22 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07F9-92 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07F5-00
filingDate	2021-05-12-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor	http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ba683dd6867ce2bc8d3c84e3c368d704 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_57b6c320da24fcf643eb534d04530002 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_757fcdb868673d7e1326189034bf72d7 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6f59f34cbe2ee9051714c40362550361 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6539781a42228b321a547e81703cf878 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_45b00afbe948bccc135124ebe8b1f9dc
publicationDate	2022-04-16-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber	TW-202214661-A
titleOfInvention	Organometallic precursor, extreme ultraviolet photoresist precursor, and method for processing photoresist layer
abstract	An organometallic precursor for extreme ultraviolet (EUV) lithography is provided. An organometallic precursor includes a chemical formula of MaXbLc, where M is a metal, X is a multidentate aromatic ligand that includes a pyrrole-like nitrogen and a pyridine-like nitrogen, L is an extreme ultraviolet (EUV) cleavable ligand, a is between 1 and 2, b is equal to or greater than 1, and c is equal to or greater than 1.
priorityDate	2020-09-30-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type	http://data.epo.org/linked-data/def/patent/Publication

Incoming Links

Predicate	Subject
isDiscussedBy	http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID6547 http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID414859283 http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID947 http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419556970

Total number of triples: 36.