| abstract |
A resist composition containing a resin component (A1) having a constitutional unit (a01) and a constitutional unit (a02) derived from compounds each represented by General Formulae (a01-1) and (a02-1), a compound (B1) represented by General Formula (b1), and a compound represented by General Formula (d1-1) or a compound represented by General Formula (d1-2), in the formulae, C<SP>t</SP> represents a tertiary carbon atom, a carbon atom at an [alpha]-position of C<SP>t</SP> constitutes a carbon-carbon unsaturated bond, Wa<SP>02</SP> represents an aromatic hydrocarbon group, and Rb1 represents hydrocarbon group, where a fluorine atom is not contained. |