| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_d80f1040809503e54509c871ba828f75 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31116 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02167
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02164
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0217
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67069
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67103
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02126
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31116 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-306
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-67 |
| filingDate |
2021-05-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_300c8675e6607771f780ad8486c16d7c
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4b3710233daaf41c92458a9bed8c47ef
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e3a6207d09eae54e09d933828eb6ebaf
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_09954123b748b5223069bc414b8f4553
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_74fc1c0443383eb107abc656c4f8b56a |
| publicationDate |
2022-02-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
TW-202207301-A |
| titleOfInvention |
Etching method and etching apparatus |
| abstract |
An object of the present invention is to provide an etching method and an etching apparatus capable of etching a film containing Si and O with high selectivity.nAn etching method for selectively etching a material containing Si and O as a solution, comprising: a process of placing a substrate containing a material containing Si and O in a processing chamber, and repeating a first period of starting supply of an alkaline gas , and the second period of supplying the fluorine-containing gas starting next, and the process of making at least a part of the second period not overlap with the first period, and heating and removing the reaction generated by the supply of the alkaline gas and the fluorine-containing gas product engineering. |
| priorityDate |
2020-05-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |