| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_89afae566b725ae78e20cf972d9bcdc7 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0273 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D3-044
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0206
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D17-08
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D11-0047
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D7-5022
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02052
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D3-43
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-425
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-426
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D7-5013
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D7-5009
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D7-3209
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31111 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-42
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-304
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C11D7-32
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C11D7-50
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
| filingDate |
2017-03-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a51be7116a241fb587bd009710d904e7
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6d1bdab49d9a238aff625cf3aea1867a
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8afbed79829e45bcfa8c1150ec8bb029 |
| publicationDate |
2021-12-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
TW-202146640-A |
| titleOfInvention |
Cleaning liquid and cleaning method for semiconductor substrate or device |
| abstract |
The present invention provides a cleaning solution and a cleaning method for semiconductor substrates or devices having particularly excellent cleaning performance for removing residues or films composed of inorganic substances containing silicon atoms and having a high flash point.nn n n A cleaning solution, which is a cleaning solution for semiconductor substrates or devices containing a water-soluble organic solvent, quaternary ammonium hydroxide, and water, wherein the water-soluble organic solvent is a glycol ether with a flash point of 60°C or higher Department of solvent or aprotic polar solvent. A cleaning method comprising using the cleaning solution to clean residues or films formed on the semiconductor substrate or attached to the device from the semiconductor substrate or the device, and the cleaning method is selected from the group consisting of a resist and an inorganic substance containing silicon atoms Residue or film composed of at least one of the group. |
| priorityDate |
2016-03-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |