http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-202145410-A

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assignee http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_ec83ea8e6721b1a5654b038fdb9b223f
classificationCPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-304
classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-687
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-67
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B08B3-10
filingDate 2021-02-25-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_439ba90653ee678ccf7cf9368f2dc908
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6f0f45e2198a21cf2a95316908dbb3b1
publicationDate 2021-12-01-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber TW-202145410-A
titleOfInvention Substrate processing method and substrate processing device
abstract The present invention is a substrate processing method comprising: a substrate holding step of holding a substrate horizontally; a substrate rotation step of rotating the horizontally held substrate around a vertical axis of rotation passing through a central portion of the substrate; and rotating the substrate in a rotated state A treatment liquid supply step for selectively supplying a treatment liquid to the peripheral portion of the substrate; curing or hardening the treatment liquid supplied to the peripheral portion of the substrate to form a treatment film that retains the object to be removed existing in the peripheral portion of the substrate. A forming step and a process film removing step of selectively supplying a process film removal liquid to the peripheral edge of the substrate in a rotating state, and removing the process film in the state of the object to be removed from the peripheral edge of the substrate.
priorityDate 2020-02-28-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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