http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-202142054-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_421cadb30fc0074fe61126eb980d19d6 |
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J2237-334 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3065 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67248 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32522 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67109 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32724 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67069 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05H1-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L23-42 |
| filingDate | 2021-02-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_50b3466abc87c420a5bbaa4f5eec43dd http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_be927c7ea4c98cfe8b176296947205f9 |
| publicationDate | 2021-11-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | TW-202142054-A |
| titleOfInvention | Plasma processing apparatus and plasma processing method |
| abstract | In order to provide a plasma processing device or a plasma processing method that improves the yield of wafer processing, the method includes: a processing chamber arranged inside a vacuum container, and a wafer to be processed is arranged inside to form a power supply slurry; and A cylindrical sample stage is arranged in the processing chamber on which the wafer is placed; and a plurality of heaters are arranged inside the sample stage, and are arranged on a plurality of radii in the radial direction from the center to the outer periphery In each of three or more radial-direction areas including a circular area and a ring-shaped area surrounding the center, which are arranged concentrically around the center, the plurality of heaters include at least one of the above-mentioned heaters The ring-shaped area is one of a plurality of arc-shaped areas divided around the center in the circumferential direction; and a plurality of temperature sensors are arranged below each of the plurality of radial-direction areas The inside of the sample stage is less than the number of the plurality of heaters; and the control unit adjusts the output of the plurality of heaters based on the output from the temperature sensor so that the temperature of the sample stage approaches the target value After that, the output of each of the plurality of heaters is adjusted to a predetermined value. |
| priorityDate | 2020-04-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
| Predicate | Subject |
|---|---|
| isDiscussedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID16217673 http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID449789534 |
Total number of triples: 21.