http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-202137278-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_4fe6aaea44d7b3cb0ace2b6c69a1c383 |
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J2237-334 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32477 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32495 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32091 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-321 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32431 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J37-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J37-32 |
| filingDate | 2020-11-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_dc50833fa6f9b8687c62c6d430f28d7b http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b954d00ca7abe334fb9cdf247292215c http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8a5ca58f2d3dc03dfd086f674fe0b928 |
| publicationDate | 2021-10-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | TW-202137278-A |
| titleOfInvention | Method for forming plasma resistant coating on parts, parts and plasma treatment device |
| abstract | The present invention provides a method for forming a plasma resistant coating on a component, a component and a plasma processing device. The method includes: providing a component; heating the component; providing a source of coating material, the coating The material source includes organic groups, oxygen atoms, and metal atoms, or the coating material source includes organic groups, oxygen atoms, metal atoms, and fluorine atoms; the gaseous coating material source is delivered to the surface of the part, the coating material source A plasma-resistant coating is formed on the surface of the component due to a chemical reaction due to heat, and the plasma-resistant coating includes a yttrium-based multi-element metal oxide or yttrium-based oxyfluoride with a stable-phase face-centered cubic structure. The parts containing the plasma resistant coating are used in the plasma etching chamber, which can reduce the corrosion of the coating by the plasma. |
| priorityDate | 2019-12-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 165.