| abstract |
A resist composition is used, which generates an acid by exposure and changes the solubility of the developer by the action of the acid. The resist composition is based on 100 parts by mass of the base material and will contain The total content of the alkali component and the acid generator component of the compound represented by general formula (d0) is specified to be 25 parts by mass or more and 60 parts by mass or less. In formula (d0), Rd 0 is a monovalent organic group. Xd 0 is -O-, -C(=O)-, -OC(=O)-, -C(=O)-O-, -S-, or -SO 2 -. Yd 0 is a divalent hydrocarbon group or a single bond which may have a substituent. M m+ represents an m-valent organic cation. m is an integer of 1 or more. |