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publicationDate 2021-09-16-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber TW-202135137-A
titleOfInvention Method and apparatus for precleaning a substrate surface prior to epitaxial growth
abstract Embodiments of the present invention generally relate to methods for removing contaminants and native oxides from substrate surfaces. The methods generally include removing contaminants disposed on the substrate surface using a plasma process, and then cleaning the substrate surface by use of a remote plasma assisted dry etch process.
priorityDate 2013-08-09-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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