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filingDate 2020-06-15-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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publicationDate 2021-09-01-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber TW-202133375-A
titleOfInvention Semiconductor device and manufacturing method thereof
abstract A device includes a first transistor, a second transistor, and a contact. The first transistor includes a first source/drain, a second source/drain, and a first gate between the first and second source/drains. The second transistor includes a third source/drain, a fourth source/drain, and a second gate between the third and fourth source/drains. The contact covers the first source/drain of the first transistor and the third source/drain of the third transistor. The first contact is electrically connected to the first source/drain of the first transistor and electrically isolated from the third source/drain of the third transistor.
priorityDate 2020-02-25-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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