http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-202132267-A

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classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C323-12
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C25D3-60
filingDate 2020-12-11-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7346cffc4905d9de12ef0bacc5d5668e
publicationDate 2021-09-01-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber TW-202132267-A
titleOfInvention Dithiopolyether glycol, its production method, SnAg plating solution containing dithiopolyether glycol, and method of forming plating film using SnAg plating solution
abstract This dithiopolyether diol has a halogen content of less than 10 ppm and a purity of 80% or more, and is represented by the following general formula (1) or (2); however, in the general formula (1) or (2), x And y is any natural number; .
priorityDate 2019-12-12-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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