http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-202131099-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_268be9afa00cf55b5aa72b1612151ecb |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-038 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C43-13 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C69-14 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-20 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
| filingDate | 2020-11-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1fc873c420032407403583685751ea8e http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_62e2892b2a05b9e1f66c57d72e144851 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_57d69c998ba644a25a483999a8d015ba http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b26f2c695054fbca30f5e6f862db1edb |
| publicationDate | 2021-08-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | TW-202131099-A |
| titleOfInvention | Sensitizing radiation-sensitive or radiation-sensitive resin composition, pattern forming method, and manufacturing method of electronic device |
| abstract | The present invention is a sensitizing radiation-sensitive or radiation-sensitive resin composition containing: a resin whose polarity is increased by the action of an acid, a photoacid generator, and a compound represented by the general formula (1), and relative to the The total mass of the sensitizing ray-sensitive or radiation-sensitive resin composition, the content of the compound represented by the general formula (1) is 0.1 mass ppm or more and 500 mass ppm or less, composed of sensitizing ray-sensitive or radiation-sensitive resin The pattern forming method using the sensitizing radiation-sensitive or radiation-sensitive resin composition and the manufacturing method of an electronic device provide sensitizing radiation that suppresses the occurrence of development defects after time and has excellent LWR performance after time A resin composition that is sensitive or radiation-sensitive, a method for forming a pattern using the above-mentioned sensitizing radiation or a radiation-sensitive resin composition, and a method for manufacturing an electronic device. In the general formula (1), R 1 to R 3 each independently represent an alkyl group having 1 to 5 carbon atoms. |
| priorityDate | 2019-11-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 199.