| abstract |
The present invention is a resist composition that generates acid due to exposure and changes the solubility of the developer liquid due to the action of the acid, and contains the dissolution of the developer liquid due to the action of acid The resin component (A1) with changed properties, the resin component (A1) has a structural unit represented by the general formula (a01-1) and a structural unit derived from the compound represented by the general formula (a02-1). In general formula (a01-1), R is a hydrogen atom, an alkyl group or a halogenated alkyl group. Yax 01 is a single bond or link base. Ax is a sulfonyl group or an alkylene group, and Rax 01 is an alkyl group, an alkoxy group, a halogen atom or a halogenated alkyl group. |