| abstract |
The present invention provides a photosensitive ray-sensitive or radiation-sensitive resin composition, a photosensitive ray-sensitive or radiation-sensitive resin film formed using the photosensitive ray-sensitive or radiation-sensitive resin composition, and a photosensitive ray-sensitive or radiation-sensitive resin film formed by using the photosensitive ray-sensitive or radiation-sensitive resin composition. Or a method for forming a pattern of a radiation-sensitive resin composition, and a method for manufacturing an electronic component, wherein the photosensitive ray-sensitive or radiation-sensitive resin composition contains: a resin (A) containing a repeating unit (a1) having a specific ring structure ); A compound (B) that generates an acid by irradiation with actinic rays or radiation; and a specific compound (C) that decomposes by irradiation with actinic rays or radiation to reduce acid trapping properties. |