http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-202120730-A

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filingDate 2020-10-30-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_de896a94567f09accfbae068860dddaa
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publicationDate 2021-06-01-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber TW-202120730-A
titleOfInvention Indium precursor compound, preparing method of thin film using the same, and substrate prepared thereof
abstract The present invention relates to an indium precursor compound, a method for preparing a thin film using the indium precursor compound, and a substrate prepared therefrom, and more specifically, to an indium precursor compound represented by Chemical Formula 1, and a thin film using the indium precursor compound The preparation method and the substrate prepared thereby. According to the present invention, a uniform thin film can be formed, and productivity can be improved due to the improvement of the deposition rate, while the thermal stability and storage stability are excellent, and the handling is easy. In the aforementioned chemical formula 1, R 1 , R 3 and R 4 are each independently a substituted or unsubstituted alkyl group having 1 to 6 carbon atoms, and R 2 is a linear or branched chain having 1 to 6 carbon atoms The alkyl group, R 5 and R 6 are each independently hydrogen or an alkyl group having 1 to 3 carbon atoms, X is a carbon atom or a hetero atom, and n is an integer of 1 to 3.
priorityDate 2019-10-30-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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