| abstract |
The present invention provides a composition for forming a resist underlayer film, a pattern forming method using the composition for forming a resist underlayer film, and a method of manufacturing an electronic device, the composition for forming a resist underlayer film contains: Polysiloxane, an acid generator, and a specific compound, in the composition for forming a resist underlayer film, relative to the total mass of the composition for forming a resist underlayer film, the amount of the specific compound The content is 0.1 mass ppm or more and 400 mass ppm or less. |