http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-202117940-A

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classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L33-36
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-44
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-8252
filingDate 2017-12-07-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ac2c7bcb68de0d98bcaa2c5dfb41a49d
publicationDate 2021-05-01-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber TW-202117940-A
titleOfInvention Semiconductor device and method of manufacturing thereof
abstract A method of manufacturing a semiconductor device includes: providing a growth substrate; forming a semiconductor contact structure on the growth substrate; forming a semiconductor stack, having a surface, on the semiconductor contact structure; removing part of the semiconductor stack to expose the semiconductor contact structure; forming a first electrode on the exposed semiconductor contact structure; forming a second electrode on the aforementioned surface of the semiconductor stack; separating the growth substrate; and removing part of the semiconductor contact structure.
priorityDate 2017-12-07-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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