| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_31da94917d1067c89f7e22444c88a836 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L29-0649
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H10B10-125
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L29-78696
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B82Y10-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L29-42392 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-823878
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-28088
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02603
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-823842
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-823807
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-823821
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02532
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L29-4908
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L29-775
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L29-78696
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L29-42392
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L27-0924
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L29-66545
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L29-0673
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L27-092
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L29-66439
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L29-0649
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H10B10-125
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-28123
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H10B10-12
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H10B10-18 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B82B1-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-8244 |
| filingDate |
2020-06-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_dca1578f6d2fdb0835c122a9c58fa05a
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d2515e3a577c70464806f2dd68515233
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_fb253ed901d7bcabc7fa8ece2be62756
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ddea53ef539e0c60b05b8b8d13a29c0f
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_303ec81d780fd36b9093197ada811ad7 |
| publicationDate |
2021-04-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
TW-202115831-A |
| titleOfInvention |
Asymmetric gate cut isolation for sram |
| abstract |
Methods of forming a gate cut isolation for an SRAM include forming a first and second active nanostructures adjacent to each other and separated by a space; forming a sacrificial liner over at least a side of the first active nanostructure facing the space, causing a first distance between a remaining portion of the space and the first active nanostructure to be greater than a second distance between the remaining portion of the space and the second active nanostructure. A gate cut isolation is formed in the remaining portion of the space such that it is closer to the second active nanostructure than the first active nanostructure. The sacrificial liner is removed, and gates formed over the active nanostructures with the gates separated from each other by the gate cut isolation. An SRAM including the gate cut isolation and an IC structure including the SRAM are also included. |
| priorityDate |
2019-07-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |