http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-202115492-A

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filingDate 2020-08-14-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1bac7da035a624f425215e5a7199c819
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f1704a587e8d201d14da6bed34410f09
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publicationDate 2021-04-16-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber TW-202115492-A
titleOfInvention Radiation-sensitive resin composition and method for forming resist pattern
abstract The present invention provides a radiation-sensitive resin composition and a method for forming a resist pattern that can exhibit sensitivity, CDU performance, and LWR performance at a sufficient level. The present invention relates to a radiation-sensitive resin composition comprising: an onium salt compound represented by the following formula (1); a resin comprising a structural unit having an acid dissociable group; and a solvent. (In the above formula (1), R 1 is a substituted or unsubstituted monovalent organic group having a cyclic structure or a chain hydrocarbon group having 2 or more carbons. X is an oxygen atom, a sulfur atom or -NR α- .R α carbon atoms is a hydrogen atom or a monovalent hydrocarbon group having 1 to 10 .Z + is a monovalent cation)
priorityDate 2019-08-29-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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