abstract |
The present invention provides a radiation-sensitive resin composition and a method for forming a resist pattern that can exhibit sensitivity, CDU performance, and LWR performance at a sufficient level. The present invention relates to a radiation-sensitive resin composition comprising: an onium salt compound represented by the following formula (1); a resin comprising a structural unit having an acid dissociable group; and a solvent. (In the above formula (1), R 1 is a substituted or unsubstituted monovalent organic group having a cyclic structure or a chain hydrocarbon group having 2 or more carbons. X is an oxygen atom, a sulfur atom or -NR α- .R α carbon atoms is a hydrogen atom or a monovalent hydrocarbon group having 1 to 10 .Z + is a monovalent cation) |