http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-202105392-A

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filingDate 2019-11-19-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d6254541eeeae5ee2a05d64467a10259
publicationDate 2021-02-01-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber TW-202105392-A
titleOfInvention Non-volatile semiconductor memory device and manufacturing method thereof
abstract According to the embodiment, the non-volatile semiconductor memory device includes: a first wiring layer extending in a first direction and arranged in a second direction; and a second wiring layer extending in a second direction above the first wiring layer Arranged in the first direction; and the third wiring layer, which extends in the first direction above the second wiring layer, and is arranged in the second direction; and the first memory cell is arranged at the intersection of the second wiring layer and the first wiring layer Part; and the second memory cell, which is arranged at the intersection of the third wiring layer and the second wiring layer; and the third memory cell, which is arranged on the first wiring layer where the first memory cell is arranged is the nearest other A first wiring layer and a second wiring layer; and an insulating layer, which is arranged between the first and third memory cells. The second wiring layer has a laminated structure of two or more layers of different materials.
priorityDate 2019-02-15-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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Total number of triples: 26.