| abstract |
To provide a composition for forming a film, which is suitable as a composition that can be formed and has resistance to extreme ultraviolet light.n(EUV) Photoresist underlayer film forming composition for photoresist underlayer film with good adhesion and good etching processability.nn n n n n A composition for film formation, which contains the compound produced in the presence of an alkaline hydrolysis catalystnThe hydrolyzable silane compound hydrolyzed condensate (A), the hydrolyzable silane compound produced in the presence of an acidic hydrolysis catalyst (B), and the solvent. |