| abstract |
The subject of the present invention is to provide a method for refining an sensitized radiation-sensitive or radiation-sensitive resin composition, which can form a pattern with suppressed defects. In addition, another subject of the present invention is to provide a pattern forming method including a refining step based on the refining method, and a manufacturing method of an electronic component using the pattern forming method. The method for refining a photosensitive ray-sensitive or radiation-sensitive resin composition of the present invention is a method for refining a photosensitive ray-sensitive or radiation-sensitive resin composition as follows, the photosensitive ray-sensitive or radiation-sensitive resin composition at least comprising: A resin whose polarity increases due to the action of an acid; a compound that generates an acid by irradiation of actinic rays or radiation; and a solvent, the compound that generates an acid by irradiation of actinic rays or radiation includes a compound selected from the group ( I) One or more compounds in the group consisting of compound (III), and the method includes a step X of filtering the sensitizing radiation-sensitive or radiation-sensitive resin composition through two or more filters. |