| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_942b4f2628f90f97a5f234adb36d4b6b
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_c63bc5ef3ae590b0603de4587961cac3 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01R31-26
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01N23-223 |
| filingDate |
2019-07-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b76b14169a12d4dec7b4c59c0dead430
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5d24262d6a7af7d62e2b0c4721add488
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ef489e09884221ef45fa73e84cb0b8e6
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_589f847ef198ff9865adf490e02864d2 |
| publicationDate |
2021-01-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
TW-202102843-A |
| titleOfInvention |
Field-biased nonlinear optical metrology using corona discharge source |
| abstract |
Various approaches can be used to interrogate a surface such as a surface of a layered semiconductor structure on a semiconductor wafer. Certain approaches employ Second Harmonic Generation while other utilize four wave-mixing or multi-wave mixing. Corona discharge may be applied to the sample to provide additional information. Some approaches involve determining current flow from a sample illuminated with radiation. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-115344902-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-115344902-B |
| priorityDate |
2019-07-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |