http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-202043423-A
Outgoing Links
Predicate | Object |
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assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_f3ac14887414890771574e163164e665 |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B24B37-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G11B5-84 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09K3-14 |
filingDate | 2019-10-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_de0cfb2a269994e28c1c3b218d2b3976 |
publicationDate | 2020-12-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | TW-202043423-A |
titleOfInvention | Polishing composition for magnetic disk substrate |
abstract | Provided is an abrasive composition for magnetic disk substrates, which can maintain productivity while reducing abrasive residues and abrasive debris on the surface of the substrate after the rough polishing process in a multi-stage polishing method, and further reduce the surface wave of the substrate . The abrasive composition is used in the subsequent rough grinding process, and contains colloidal silica, water-soluble polymer compounds and water. In the particle size distribution of colloidal silica on the volume basis measured by Heywood diameter, the cumulative volume frequency of the particle size of 50nm is more than 35%, and in the particle size distribution, the cumulative volume frequency of the particle size of 15nm is less than 90%. A water-soluble polymer compound is a mixture of polymers containing monomers with carboxylic acid groups as essential monomers and polymers containing monomers with sulfonic acid groups as essential monomers, and/or with carboxylic acids Monomers with sulfonic acid groups and sulfonic acid groups are copolymers of essential monomers. |
priorityDate | 2018-10-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 158.