http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-202043320-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_20d3042eb4ea7c9afd525aa89373349d |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05K3-28 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05K3-287 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F2-50 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F290-14 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F290-144 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-028 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01B3-44 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05K3-28 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G59-17 |
| filingDate | 2020-02-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9286d172ba1bdb81c54c098e573da0b6 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2643ced3e26d20e35c65456987ff0b36 |
| publicationDate | 2020-12-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | TW-202043320-A |
| titleOfInvention | Acid group-containing (meth)acrylate resin, curable resin composition, hardened material, insulating material, resin material for solder mask, and solder mask component |
| abstract | The present invention provides an acid group-containing (meth)acrylate resin, a curable resin composition containing the same, a cured product composed of the aforementioned curable resin composition, an insulating material, a solder resist resin material, and a solder resist The component; wherein the acid group-containing (meth)acrylate resin is characterized by the following components as the necessary reaction materials: the reaction of epoxy resin (A), unsaturated monobasic acid (B), and polybasic acid anhydride (C) Compound (I); epoxy resin (D); and unsaturated monobasic acid (E). This acid group-containing (meth)acrylate resin has excellent photosensitivity and alkali developability, and can form a cured product with excellent elongation. |
| priorityDate | 2019-03-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 232.