| abstract |
The present invention provides a cleaning agent composition and cleaning method. When cleaning semiconductor substrates and other substrates, the temporary adhesion caused by the adhesive layer obtained by using a polysiloxane-based adhesive is peeled off. The agent residue can obtain good cleaning performance, and will not corrode the substrate and can clean the substrate with high efficiency.nn n n The detergent composition of the present invention is a detergent composition used to remove the silicone adhesive remaining on the substrate, and is characterized in that it contains tetrakis (hydrocarbon) ammonium fluoride and an organic solvent; the aforementioned organic The solvent contains the endoamide compound represented by the formula (1) and the ether compound containing a cyclic structure, and the aforementioned ether compound containing the cyclic structure contains a cyclic ether compound and a cyclic alkyl chain alkyl ether compound , At least one of cyclic alkyl branched alkyl ether compound and bis(cyclic alkyl) ether compound;nn n n n n n n n n n (In the formula, R 101 represents an alkyl group with 1 to 6 carbon atoms, and R 102 represents an alkylene group with 1 to 6 carbon atoms). |