| abstract |
The present invention provides a cleaning agent composition and cleaning method, which are used for cleaning semiconductor substrates and other substrates, for example, after peeling off an adhesive layer obtained by using a polysiloxane-based adhesive Adhesive residues can obtain good cleaning performance, and at the same time, the substrate can be cleaned efficiently without corroding the substrate.nn n n n n The aforementioned detergent composition is, for example, a detergent composition for removing polysiloxane-based adhesives, which contains a quaternary ammonium salt, an etching rate accelerator composed of a zwitterionic surfactant, and an organic Solvent. |