| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_356068227e13eed6ff524f07808e0bf7 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D1-72
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D3-2086
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D3-2082
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D3-2079 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B08B3-08
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B08B3-12
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D3-43
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02074
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D11-0047
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D1-72
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D1-825
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D1-8255
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02052
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D3-3409
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D3-3418
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D3-2075
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D3-2086
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D3-2082
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D3-042 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C11D11-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C11D1-825
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B08B3-12
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B08B3-10
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B08B3-08
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-67
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C11D3-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C11D3-04 |
| filingDate |
2020-02-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e54d59c7f8a9d70c99c7927ae42f496f
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_506b0b144eb81ba8e6fe7025598e9232
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_990a19b2b51819bb2c5e5562de5f5e5a
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e6d617921e52e68f20de4f87b187481d |
| publicationDate |
2020-09-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
TW-202033758-A |
| titleOfInvention |
Cleaning liquid composition for semiconductor wafer and cleaning method using the same |
| abstract |
The present invention relates to a cleaning solution composition used for semiconductor wafers in the manufacture of semiconductor devices and a cleaning method using the cleaning solution composition. The cleaning liquid composition includes: a surfactant composed of chemical formula 1 and chemical formula 2; inorganic acid or organic acid; and the balance of water. The semiconductor wafer cleaning method of the present invention is a method of immersing the semiconductor wafer in the cleaning solution composition for 100 seconds to 500 seconds. According to the cleaning solution composition and cleaning method of the present invention, it is possible to provide significantly improved removal efficiency and effective cleaning ability for contaminants in the polishing process of the surface of a semiconductor device manufacturing wafer, especially for organic wax. As a result, the surface of the wafer can be highly cleaned, thereby exhibiting the effect of being able to manufacture highly reliable semiconductor elements. |
| priorityDate |
2019-03-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |