| abstract |
The present invention provides a urethane resin composition containing polyol (a), polyisocyanate (b), and urethane resin (X) using chain extender (c) as raw materials, and is characterized in According to the pulse NMR measurement method, the presence ratio of the amorphous phase of the urethane resin (X) is in the range of 20-50% and the presence ratio of the crystalline phase is in the range of 20-50%. In addition, the present invention provides a polishing pad characterized by having a porous body made of the aforementioned urethane resin composition. The weight average molecular weight of the aforementioned urethane resin (X) is preferably in the range of 120,000 to 300,000. In addition, the use ratio of the polyisocyanate (b) in the raw material constituting the urethane resin (X) is preferably in the range of 30 to 45% by mass. |