http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-202030554-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_89afae566b725ae78e20cf972d9bcdc7 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-105 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-031 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-26 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2012 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-028 |
| filingDate | 2019-11-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2ed51fe5e6922ebe064b7f5c1b34543e http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1b1e52c7270c45b482a806a050e8a0fe http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f545f308a8bbf3f58f87c0b482d822b4 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a4b82f3811cc59f804f728979e50b55c |
| publicationDate | 2020-08-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | TW-202030554-A |
| titleOfInvention | Photosensitive resin composition, method for producing patterned cured film, and patterned cured film |
| abstract | The present invention provides a photosensitive resin composition capable of forming a patterned cured film with excellent linearity and adhesion to a substrate, and a good cross-sectional shape, and a patterned cured film using the photosensitive resin composition Manufacturing method, and patterned cured film that can be manufactured by the manufacturing method.nIn the photosensitive resin composition of the present invention comprising an alkali-soluble resin (A), a photopolymerizable monomer (B), and a photopolymerization initiator (C), the nitrated specific carbazole ring-containing The oxime ester compound of the structure of the photopolymerization initiator (CI) is used in combination with other photopolymerization initiators (C-II) other than the photopolymerization initiator (C-II). |
| priorityDate | 2018-11-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
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