http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-202028303-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_8205ec6ee1cd95eb60a03826535bad97 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08L79-08 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08K5-12 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G73-10 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08J5-18 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G73-10 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-312 |
| filingDate | 2019-10-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b946eab539dd527dc8c7219008be788c http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2a580db05ecb182dae46e81b0f562d39 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_503d83e4c3216ecc3a7c742867317f00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_151c69e12a3868e0c9a67b4d471190a4 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7a1ea6e2067d6b18b167980a90d4255b http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0790d013218abfcc044af374604f8282 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b794f475fa06ec96725954041b9416f5 |
| publicationDate | 2020-08-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | TW-202028303-A |
| titleOfInvention | Polyurethane resin composition |
| abstract | The present invention provides a photosensitive resin composition capable of imparting a hardened body with low dielectric constant and low loss factor, a method of using the photosensitive resin composition to produce a substrate with a hardened relief pattern, and the hardening A three-dimensional semiconductor device. A polyimide resin composition comprising: (A) a polyimide precursor having a unit structure represented by the following general formula (1): [In the formula, X 1 is a tetravalent organic group, Y 1 is a divalent organic group, and R 1 and R 2 are each independently a monovalent organic group]; and (B) is represented by the following general formula (30) Said carboxylic acid compound or its anhydrate: [In the formula, Z 1 and Z 2 each independently represent a hydrogen atom, an alkyl group, etc., and Z 1 and Z 2 may be bonded to each other to form a ring. When the ring is an aromatic ring, Indicates that HOOC is a conjugated double bond in the ortho position relative to COOH. When the ring is other than an aromatic ring, It means that HOOC is a cis double bond with respect to COOH]; It may further contain optional (P): a polymer compound other than the polyimide precursor (A); the carboxylic acid compound or its anhydrate (B ), it is possible to form a chemical bond with the polyimide precursor (A) and/or the polymer compound (P) other than the polyimide precursor (A) via Z 1 or Z 2 . |
| priorityDate | 2018-10-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
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