| abstract |
A method for depositing a metal oxide film in a liquid environment, comprising steps of: (S1) dissolving an oxidizing agent in solvent with hydrogen bond to form a solution, and (S2) placing a substrate into the solution for performing a deposition reaction to deposit a metal oxide hydroxide film on the substrate, wherein the oxidizing agent is potassium permanganate, potassium chromate, or potassium dichromate, a reaction temperature of the deposition reaction ranges from 1 to 99 degrees Celsius, and a reaction pressure environment of the deposition reaction is an atmospheric pressure environment. |