| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_268be9afa00cf55b5aa72b1612151ecb |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-038
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-037
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G73-22
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G73-12 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-40
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F2-46
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G73-10
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G73-22 |
| filingDate |
2019-09-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6fdddc13236fefbcf9433cab71261f27
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ff94e4ebc711b446437e3db5696755b6
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1fc873c420032407403583685751ea8e |
| publicationDate |
2020-06-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
TW-202020023-A |
| titleOfInvention |
Photosensitive resin composition, cured film, laminate, method for manufacturing cured film, semiconductor device, and hot alkali generator |
| abstract |
The present invention provides a new thermal base generator and realizes the diversification of materials in the field of photosensitive resin compositions containing specific polymer precursors. In addition, a method for producing a photosensitive resin composition, a cured film, a laminate, and a cured film capable of combining both excellent storage stability in a photosensitive resin composition and excellent mechanical properties in a cured film according to needs, and Hot alkali generator. The photosensitive resin composition contains at least one polymer precursor selected from the group consisting of a polyimide precursor and a polybenzoxazole precursor, a specific thermal base generator, and a photosensitizer. |
| priorityDate |
2018-09-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |