abstract |
The present invention provides a photosensitive resin composition having excellent sensitivity to EUV of the formed resist film and excellent LER of the positive pattern formed by EUV exposure. In addition, the present invention provides a resist film, a pattern forming method and an electronic device manufacturing method using the above-mentioned sensitized radiation or radiation sensitive resin composition. The sensitized radiation or radiation sensitive resin composition of the present invention includes a compound that generates an acid by irradiation with actinic rays or radiation, and a resin whose polarity is increased by the action of an acid. The resin includes the general formula (B- 1) Represented repeating unit. |