| abstract |
An embodiment of the present invention relates to a polishing liquid for CMP for polishing a surface to be polished having at least a portion containing cobalt and a metal-containing portion containing a metal other than cobalt, and containing abrasive particles, a metal corrosion inhibitor, and when / or organic acids, and water, pH value of 4.0 or less, measured corrosion potential E a cobalt metal and the corrosion potential E B of the polishing liquid in the CMP, the corrosion potential and corrosion potential E a E B of The absolute value of the corrosion potential difference E A -E B is 0 mV to 300 mV. |