| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_268be9afa00cf55b5aa72b1612151ecb |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-1806
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-585
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0046
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0382
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-038
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F212-24
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-26
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-24
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-20 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-20 |
| filingDate |
2019-08-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2ee0e7ae3c8a0a5115e1d805c445c1a6
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a0327eaf502f9378ae2750cef889d5a9
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9d773c26933f47f09f8fae9fcf14edf1
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_fc5ec654fdab69aba5e5ee430a267bb4 |
| publicationDate |
2020-04-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
TW-202013075-A |
| titleOfInvention |
Photosensitive or radiation-sensitive resin composition, resist film, pattern forming method, manufacturing method of electronic device |
| abstract |
The present invention provides a sensitized radiation or radiation-sensitive resin composition excellent in LER performance and collapse suppression performance. In addition, a resist film, a pattern forming method, and an electronic device manufacturing method are provided. The sensitized radioactive or radiation-sensitive resin composition of the present invention includes a resin whose polarity is increased by the action of an acid and a compound that generates an acid by irradiation of actinic rays or radiation. In the composition, the resin has a repeating unit represented by the general formula (B-1). |
| priorityDate |
2018-09-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |