| abstract |
The present invention improves the productivity during film formation by PEALD.nThe film forming apparatus for forming a specific film on a substrate by PEALD of the present invention includes: a processing container that houses the substrate airtight; and a mounting table that mounts the substrate in the processing container; the processing container has: an exhaust port , Which is used to evacuate the processing container; an exhaust path, which connects the processing area in the processing container above the mounting table to the exhaust port; and a partition wall portion, which is located in the exhaust path The processing area side is separated from the exhaust port side; the partition wall portion has a flow path that communicates the processing area side and the exhaust port side, and the partition wall portion extends in a direction in which the exhaust passage extends In the plan view, the exhaust port side is not seen from the processing region side. |