| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_1894637205a6363e54f3117d66b6fa14 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K3-1409
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09G1-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K3-1472
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-30625
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K3-1436
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K3-1454 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-304
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09G1-02 |
| filingDate |
2019-07-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7cf17415066be08ff2badd13e467ba2d
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_409f607323265f3c8139944d9f65ba4f
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_284b7a0c422f1072ff693cee4f6f22c0 |
| publicationDate |
2020-04-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
TW-202012563-A |
| titleOfInvention |
Polishing slurry composition |
| abstract |
The invention relates to a polishing slurry composition, including: polishing particles; a dispersant; a stabilizer; and a polishing selectivity adjuster; the dispersant includes an aromatic organic acid containing more than one carboxyl group (-COOH). |
| priorityDate |
2018-09-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |