| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_89afae566b725ae78e20cf972d9bcdc7 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-11
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08K5-375
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08K5-55 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0042
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-26
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08L33-14
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08L33-08
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08L33-10
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-281
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-14
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08K5-55 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F220-06
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F220-18
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L33-14
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F220-26
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L33-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L33-06
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-26
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08K5-55
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08K5-375
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08K5-42 |
| filingDate |
2019-05-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4da147af6c5d2234835ca331337f8a8c
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_dd6b9d0f9c4f086cca5768a6f099a6ac
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_164dc69fc7a29d8ef9a68fac4f41772f |
| publicationDate |
2020-04-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
TW-202012523-A |
| titleOfInvention |
Chemically-enhanced positive photosensitive resin composition, photosensitive dry film, method for manufacturing photosensitive dry film, method for manufacturing patterned resist film, method for manufacturing mold-attached substrate, and method for manufacturing plated product |
| abstract |
An object of the present invention is to provide a chemically-enhanced positive photosensitive resin composition with high sensitivity and easy formation of a resist pattern having a rectangular cross-sectional shape, and a composition comprising the chemically-enhanced positive photosensitive resin composition The photosensitive dry film of the photosensitive resin layer, the method for manufacturing the photosensitive dry film, the method for manufacturing the patterned resist film using the aforementioned chemically enhanced positive photosensitive resin composition, and the use of the aforementioned A method of manufacturing a mold-attached substrate of a chemically enhanced positive photosensitive resin composition, and a method of manufacturing a plated article using the mold-attached substrate.nAs a solution of the present invention, a chemical comprising an acid generator (A) that generates an acid by irradiation with active light or radiation, and a resin (B) that increases the solubility to alkali by the action of an acid The reinforced positive photosensitive resin composition contains a Lewis acidic compound (C). |
| priorityDate |
2018-05-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |