http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-202012105-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_ccb2f721f6d2a7f79ce09d39998cea87 |
| classificationIPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L75-04 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-304 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B24B37-26 |
| filingDate | 2019-09-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0076f6f3cc603e05c49f8829613e2a02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_030cafb5b3c286174c2ac43e72eddced http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4b453e6b20be2a43d6ab27732ce601a7 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6b8e0681609f53b2dfacecd1524b4c52 |
| publicationDate | 2020-04-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | TW-202012105-A |
| titleOfInvention | Grinding pad and manufacturing method thereof |
| abstract | The present invention aims to provide a polishing pad that shortens the time required for running-in and reduces defects in the initial stage of polishing. A polishing pad having a polishing layer for polishing an object to be polished. The polishing pad is characterized in that, with respect to the average surface of the polishing surface of the polishing layer, an arithmetic average height (Sa ) Is 3 to 10 (μm), and the average of the main curvature of the peak apex of the polished surface, that is, the arithmetic mean curvature (Spc) of the peak apex, is 200 to 600 (1/mm). |
| priorityDate | 2018-09-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 49.