http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-202007766-A

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assignee http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_268be9afa00cf55b5aa72b1612151ecb
classificationCPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-308
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L27-146
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classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L31-10
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09K13-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L27-146
filingDate 2019-07-11-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a9cc9ccffa31b8a092f6edd7dcb7a989
publicationDate 2020-02-16-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber TW-202007766-A
titleOfInvention Treatment solution and treatment method
abstract An object of the present invention is to provide a treatment liquid and a treatment method capable of selectively removing an InP layer and suppressing corrosion of the InAlAs layer when applied to a laminate including an InP layer and an InAlAs layer. The present invention is a treatment liquid and a treatment method, the treatment liquid contains at least one kind of hydrogen halide and a resist selected from the group consisting of hydrogen chloride and hydrogen bromide, and the coarse particles with a particle diameter of 0.1 μm or more per 1 mL of the treatment liquid The number of particles is less than 100 particles/mL, the number of coarse particles with a particle size of 0.05 μm or more per 1 mL of processing solution is less than 500 particles/mL, and the number of coarse particles with a particle size of 0.1 μm or more per 1 mL of processing solution The ratio to the number of coarse particles with a particle diameter of 0.05 μm or more per 1 mL of the treatment liquid is greater than 0.010 and less than 1.000.
priorityDate 2018-07-20-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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