http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-202007512-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_76a4667969472ddc72c7343162b48f10 |
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B29K2105-0044 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08K2201-012 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08K5-005 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08K5-1545 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B29C33-62 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B29C64-124 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B29C64-40 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09D183-04 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09D5-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09D7-40 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B29C33-64 |
| filingDate | 2018-07-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d1c8447c76e6a3586f7e479422171a87 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1a64e1e2e2b3d98dc993450541b4f610 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a9f1ce9e6481c3f69c51693f1094d712 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_37d097e5907466d23785cdedf4e3856b |
| publicationDate | 2020-02-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | TW-202007512-A |
| titleOfInvention | Method for reducing drawing force in forming process of photo-curing material |
| abstract | The invention provides a method for reducing the pull-out force of a photocuring material during a molding process, which is to add a radical scavenger capable of terminating a radical polymerization reaction to a substrate used for carrying a photocurable material. The method includes the following steps: providing a A release material composition containing at least a free radical scavenger and a molding agent; the release material composition is formed by curing or combining with the upper surface of a plate to form a release film to form the substrate; wherein The free radical scavenger is suitable for inhibiting free radicals released by the photo-curing material during the photo-curing process. Thereby, during the photocuring reaction of the photocurable material by irradiation of the light source, the radical scavenger in the upper surface of the substrate in contact with the photocurable material can react with the radicals in the photocurable material, so that the The photocurable material forms an uncured layer on the upper surface of the substrate that does not undergo photocuring. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-113801475-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-113801475-B |
| priorityDate | 2018-07-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 99.